Electron Beam Source
E-beam sources for high-power electron-beam deposition processes are supplied. They support various coating materials including metals, oxides, and optical thin films, with output and beam-deflection conditions reviewed for the equipment specification.
Ion Beam Source
End-Hall type ion beam sources are used for film adhesion improvement, surface activation, and ion-assisted deposition processes. Applicability is reviewed with process gases such as Ar and O2 and operating voltage/current conditions.
Optical Coating Applications
Component configurations are supported for processes where optical-thickness control and film uniformity are important, including laser optics, precision optic coating, and ophthalmic lens AR coating.
Component Application Review
Suitable vacuum components and replacement or upgrade directions can be reviewed according to existing equipment specifications, process goals, target films, and control methods.